Optics Express- 微焦點 X 射線光柵干涉儀用于光學(xué)計量和波前表征-X射線光柵
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Optics metrology and at-wavelength wavefront characterization by a microfocus X-ray grating interferometer
Abstract
A microfocus X-ray grating interferometer (MFXGI) is proposed to measure the profile of the X-ray wavefront and slope error of X-ray optical elements. This device consists of a phase grating G1 to modulate the incoming wavefront and an absorption grating G2 as a transmission mask for the position-sensitive detector. The wavefront distortions caused by the deformable mirror were analyzed under operating conditions for in situ investigation of X-ray optical elements. The MFXGI can obtain direct and reflected beams in one recorded image at the same time through a microfocus X-ray source. The direct beam can be used to calculate the parameter errors and spherical shape for error compensation and retrieve the aspherical shape of the height profile. This instrument is expected to be a valuable tool for further technical progress in X-ray adaptive optics and X-ray mirror manufacturing and mounting.
微焦點 X 射線光柵干涉儀用于光學(xué)計量和波前表征
提出了一種微焦點X射線光柵干涉儀（MFXGI）來測量X射線波前的輪廓和X射線光學(xué)元件的斜率誤差。 該裝置由一個相位光柵 G1 和一個吸收光柵 G2 組成，G1用于調(diào)制入射波前，G2 作為位置敏感探測器的透射掩模。 由可變形反射鏡引起的波前畸變在工作條件下進行了分析，用于 X 射線光學(xué)元件的原位研究。 MFXGI 可以通過微焦點 X 射線源在一張記錄圖像中同時獲得直射和反射光束。 直接光束可用于計算參數(shù)誤差和球面形狀以進行誤差補償并檢索高度輪廓的非球面形狀。 該儀器有望成為 X 射線自適應(yīng)光學(xué)和 X 射線鏡制造和安裝方面進一步技術(shù)進步的寶貴工具。
文章中所使用的光柵是由德國Microworks生產(chǎn)定制、生產(chǎn)的（點擊了解詳情）。光柵具體參數(shù)如下：
相位光柵由環(huán)氧樹脂在聚酰亞胺基板上制成，間距為p1=5.366μm，厚度為20μm。 G2的間距為p2=3μm，在聚酰亞胺基板上電鍍金。