用于極紫外實(shí)驗(yàn)的多層膜鍍膜技術(shù)
EUV多層膜是為像高次諧波應(yīng)用這樣的實(shí)驗(yàn)設(shè)計(jì)和制作的。在本文中，我們將展示適用于8nm -50nm波段的 Ru/B4C 、 Mo/Si、 Zr/Al Si和 SiC/Mg 多層膜的最新成果。這些多層膜都容易根據(jù)實(shí)驗(yàn)的具體要求定制參數(shù)，包括入射角、峰值波長(zhǎng)和帶寬。
01
引言
02
8-12nm波段適用的多層膜
圖1. Pd/B4C(藍(lán)線)、Ru/B4C(紅線)和Mo/B4C(綠線)多層膜的反射率；(a) 8 nm、(b) 10 nm和(c) 12 nm。
圖2. 設(shè)計(jì)用于在入射角為45°，峰值波長(zhǎng)為8.8 nm時(shí)的Ru/B4C多層膜(藍(lán)點(diǎn))的反射率譜圖，紅線為假設(shè)層間粗糙度為0.4 nm時(shí)的的模擬反射率。
03
波長(zhǎng)13.5nm適用的多層膜
圖3. Mo/Si多層膜反射率實(shí)測(cè)圖
入射角為6°
入射角為45°
圖4. MoSi2/Si窄帶多層膜和Ru/Si寬帶多層膜的反射率（假設(shè)層間粗糙度為0.7 nm）
04
17nm-25nm波段適用的多層膜
圖5. Zr/Al-Si(藍(lán)線)、C/Al-Si(紅線)和Y/Al-Si(綠線)的模擬反射率
圖6. (a) (d)高反射率、(b) (e)窄帶反射率和(c) (f)寬帶反射率Zr/Al-Si(藍(lán)線)和Mo/Si(紅虛線)多層膜的計(jì)算反射曲線。(a)、(b)和(c)AOI=0℃，(d)、(e)和(f)AOI=45℃。
注：圖5和圖6中的計(jì)算是假設(shè)在像表面無(wú)氧化、層間光滑等理想情況下的得到的。
窄帶Zr/Al-Si多層膜在入射角為45度時(shí)的反射率測(cè)量結(jié)果如圖7所示，峰值波長(zhǎng)為(a) 18 nm和(b) 21 nm。表面氧化和層間粗糙度大約為4nm和0.5 nm。該窄帶鏡在18 nm處的反射率峰值為45%，帶寬（半峰全寬FWHM）為0.7 nm，在21 nm處的反射率峰值為34%，帶寬（半高全寬FWHM）為0.8 nm。
圖7. Zr/Al-Si多層膜在入射角為45°時(shí)的反射率
18nm優(yōu)化
21nm優(yōu)化
05
25nm-50nm波段適用的多層膜
圖8. SiC/Mg窄帶多層膜反射率的實(shí)測(cè)結(jié)果；入射角為6度。
圖9. Mo/Si寬帶多層膜的反射率(藍(lán)線)和反射相位(紅虛線），6度入射
兩塊多層膜
指定覆蓋層
06
結(jié)論
07
應(yīng)用實(shí)例
定制 EUV/X-ray 光學(xué)元件：
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